Two-dimensional (2D) transition metal dichalcogenides (TMDCs) like molybdenum disulfide (MoS2) and tungsten disulfide (WS2) are effective components in optoelectronic devices due to their tunable and attractive electric, optical and chemical properties. Combining different 2D TMDCs into either vertical or lateral heterostructures has been pursued to achieve new optical and electronic properties. Chemical treatments have also been pursued to effectively tune the properties of 2D TMDCs. Among many chemical routes that have been studied, plasma treatment is notable for being rapid and versatile. In Wang’s group earlier work, plasma treatment of MoS2 and WS2 resulted in the formation of MoO3 and WO3 nanosheets and nanoscrolls. However, plasma treatment of 2D TMDC heterostructures have not been widely studied. In this dissertation, MoS2/WS2 vertical and lateral heterostructures were grown and treated with air plasma. The result showed that the vertical heterostructure and lateral heterostructures behaved differently. For the vertical heterostructures, the top WS2 layer acts as a shield for the underlying MoS2 monolayer from oxidizing and forming transition metal oxide nanoscrolls, as shown by Raman spectroscopy and atomic force microscopy (AFM). On the contrary, for the lateral heterostructures, the WS2 that was grown surrounding the MoS2 triangular core served as a tight frame to stop the propagation of the oxidized MoS2, resulting a gradient of crack distribution. These findings provide insight into how plasma treatment can affect the formation of oxide in heterostructure, which can have further application in nanoelectronic devices and electrocatalysts.