Description
Semiconductor manufacturing facilities are very complex and capital intensive in nature. During the lifecycle of these facilities various disciplines come together, generate and use a tremendous amount of building and process information to support various decisions that enable them to

Semiconductor manufacturing facilities are very complex and capital intensive in nature. During the lifecycle of these facilities various disciplines come together, generate and use a tremendous amount of building and process information to support various decisions that enable them to successfully design, build and sustain these advanced facilities. However, a majority of the information generated and processes taking place are neither integrated nor interoperable and result in a high degree of redundancy. The objective of this thesis is to build an interoperable Building Information Model (BIM) for the Base-Build and Tool Installation in a semiconductor manufacturing facility. It examines existing processes and data exchange standards available to facilitate the implementation of BIM and provides a framework for the development of processes and standards that can help in building an intelligent information model for a semiconductor manufacturing facility. To understand the nature of the flow of information between the various stakeholders the flow of information between the facility designer, process tool manufacturer and tool layout designer is examined. An information model for the base build and process tool is built and the industry standards SEMI E6 and SEMI E51 are used as a basis to model the information. It is found that applications used to create information models support interoperable industry standard formats such as the Industry Foundation Classes (IFC) and ISO 15926 in a limited manner. A gap analysis has revealed that interoperability standards applicable to the semiconductor manufacturing industry such as the IFC and ISO15926 need to be expanded to support information transfers unique to the industry. Information modeling for a semiconductor manufacturing facility is unique in that it is a process model (Process Tool Information Model) within a building model (Building Information Model), each of them supported more robustly by different interoperability standards. Applications support interoperability data standards specific to the domain or industry they serve but information transfers need to occur between the various domains. To facilitate flow of information between the different domains it is recommended that a mapping of the industry standards be undertaken and translators between them be developed for business use.
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    Title
    • Implementation of building information modeling for wafer fab construction
    Contributors
    Date Created
    2011
    Resource Type
  • Text
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    Note
    • thesis
      Partial requirement for: M.S., Arizona State University, 2011
    • bibliography
      Includes bibliographical references (p. 108-111)
    • Field of study: Construction management

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    by Shruthi Pindukuri

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