Full metadata
Title
Characterization of Stress in Electroplated Copper
Description
Current solar cells use a silver-printed front grid for electron conduction. Unfortunately, silver is expensive, leading to research into alternative materials. Copper is the most viable but poses grain growth problems and stress problems silver does not. This paper has characterised the effects of proprietary additives, thickness of the copper film layer, current density, and grain growth on stress. Per Stoney's equation, increased thickness leads to decreased thickness. However, if the current density is too high, the plated copper will become porous. Grain growth, quantified by the ratio of the intensity of the (1 1 1) plane and the (2 0 0) plane, increases over time, thus increasing the ratio which further equations to increased stress. Future work would be gathering more data to further investigate the relationship between additives and stress, current densities and stress, and grain growth over time and stress.
Date Created
2018-05
Contributors
- Simonet, Danny (Co-author)
- Chang, Celine (Co-author)
- Bowden, Stuart (Thesis director)
- Karas, Joseph (Committee member)
- Division of Teacher Preparation (Contributor)
- Mechanical and Aerospace Engineering Program (Contributor)
- Barrett, The Honors College (Contributor)
Topical Subject
Resource Type
Extent
31 pages
Language
eng
Copyright Statement
In Copyright
Primary Member of
Series
Academic Year 2017-2018
Handle
https://hdl.handle.net/2286/R.I.48219
Level of coding
minimal
Cataloging Standards
System Created
- 2018-04-21 12:23:50
System Modified
- 2021-08-11 04:09:57
- 3 years 2 months ago
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